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        Product laser

        Products
        Laser Micro-Etching System
        Product Introduction
        This system adopts DR Laser’s proprietary optical homogenization technology to perform large-area, high-precision, and uniform laser etching on various tunnel oxide passivation layers. It is widely used in the patterning of high-efficiency back-contact (XBC) solar cells, offering a superior alternative to traditional photolithography and accelerating the industrialization of low-cost back-contact cell technologies.
        Product Features

        Ultrafast laser processing system combined with F-theta beam shaping and homogenization, enabling non-destructive ablation of oxide and passivation films

        Customizable square beam spot sizes tailored to specific process requirements

        Fine-pattern control technology ensures precise separation between P/N regions

        In-house developed high-precision vision algorithms for accurate alignment

        High throughput, high precision, high uniformity, and high stability

        Multiple in-line inspection functions to ensure superior product yield

        Modular design with strong compatibility and customizable configurations


        Field of application
        XBC and TOPCon solar cell manufacturing
        Technical indicators
        Specification
        Details
        Equipment Dimensions (L×W×H)
        6000 mm × 4000 mm × 2200 mm
        Compatible Wafer Size
        182 to 230 mm, supports various rectangular formats
        Wafer Thickness Range
        100 to 180 μm
        Loading/Unloading Mode
        AGV dual-layer dual-track system
        Cassette Capacity
        5×2 + 1 + 1
        Throughput
        ≥ 4000 pcs/h @ 182 mm × 182 mm

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